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Add:Tangyan Mansion, No. 58 Keji 1st Road, High tech Zone, Xi'an City, Shaanxi Province, P. R. of China.
Phone: 0086-29-84504928
E-mail: Tisales@omdtimetal.com
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The main uses of metal targets include flat panel displays, semiconductors, solar cells and recording media.
Flat panel displays: Metal targets play an important role in the manufacture of flat panel displays and are mainly used to prepare electronic thin film materials. For example, metal targets such as aluminum targets, titanium targets, and tantalum targets are used to manufacture liquid crystal panels through physical vapor deposition (PVD) processes, with an application ratio of up to 33.8%.
Semiconductors: In the semiconductor industry, metal targets are used to manufacture metal wires that transmit information. The surface of the metal target is bombarded by high-speed ion flow under high vacuum conditions, so that atoms are deposited on the semiconductor chip. After special processing, the deposited metal film is etched into nano-scale metal wires to connect the micro transistors in the chip to achieve signal transmission.
Solar cells: Metal targets are also widely used in the manufacture of solar cells. For example, the combined use of copper targets and tantalum targets is gradually increasing in wafer manufacturing, especially the demand for copper wire processes is growing, which shows the importance of copper and tantalum targets in the field of solar cells.
Recording media: Metal targets also play a key role in the preparation of recording media. Through different sputtering processes, thin films with various functions can be obtained, such as super-hard, wear-resistant, and corrosion-resistant alloy films. These thin film materials are widely used in data storage media.
High Purity Titanium Sputtering Target
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.
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Hafnium Pellets Hf Pellets
Hafnium Pellets (Hf Pellets) have a great ability to shed electrons into the air and have a high melting point. Hafnium Pellets (Hf Pellets) can be used in semiconductors, Chemical Vapor Deposition (CVD), and Physical Vapor Deposition (PVD) processes including Thermal and Electron Beam (E-Beam) Evaporation, Low-Temperature Organic Evaporation, Atomic Layer Deposition (ALD), Metallic-Organic and Chemical Vapor Deposition (MOCVD), etc.
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Tantalum Sputtering Target R05200 R05400
Tantalum (Ta) is a refractory metal critical to the architecture of microchips. High purity Ta targets are used to sputter microscopic thin layers of tantalum on silicon wafers, enabling the manufacturing semiconductor logic chips with high performance. In addition, it is used as a diffusion barrier in semiconductor processing, and as a protective coating in the medical industry.
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Zirconium Sputtering Target
Zirconium is silvery-white in appearance and its propensity for corrosion resistance makes it heavily used by the chemical industry. Zirconium can be found in surgical appliances, superconductive magnets, and the cladding of nuclear reactors. It is also utilized as an alloying agent for steel. Its compound, zirconia, is often a substitute for diamonds in jewelry. Zirconium, along with its alloys and compounds, is evaporated under vacuum for optical coatings, semiconductors, and data storage devices.
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High Purity Tantalum (Ta) Pellets
Tantalum pellets, also known as Tantalum sputtering targets, are used primarily in the physical vapor deposition (PVD) process for thin film deposition.Tantalum pellets are used in a variety of industries and fields, including electronics, aerospace, medical, chemical processing, and defense. It is used in capacitor manufacturing, vacuum furnace components, chemical processing equipment, medical implants, and radiation shielding, among others.
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Niobium Pellets Evaporation Material (Nb)
Niobium is a light grey, crystalline, and ductile transition metal. High-purity niobium metal has higher ductility. Niobium oxidizes in the earth’s atmosphere very slowly, hence its application in jewelry as a hypoallergenic alternative to nickel. Niobium has a very low capture cross-section for thermal neutrons, so it is quite useful in the nuclear industry.
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