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Tantalum Sputtering Target R05200 R05400
- Description
-
Material Grade: Pure Ta: R05200; R05400
R05200, unalloyed tantalum, electron-beam furnace or vacuum-arc melt, or both
R05400, unalloyed tantalum, powder-metallurgy consolidation.Purity: 99.95%; 99.99%
Standard Specification: ASTM B708
Chemical Components (wt%, max):
Item
O
N
C
H
Nb
Mo
W
Ti
Si
Fe
Ni
Tantalum
R05200
0.015
0.010
0.010
0.0015
0.10
0.020
0.050
0.010
0.005
0.010
0.010
Remainder
R05400
0.030
0.010
0.010
0.0015
0.10
0.020
0.050
0.010
0.005
0.010
0.010
Remainder
Tatanlum Description:
Tantalum, a versatile metal, finds widespread applications across diverse industries. In laboratories, it's an essential component for precision equipment, ensuring accuracy in scientific experiments. Its role as a cost-effective substitute for platinum makes it valuable in various industrial processes. Tantalum's presence is vital in manufacturing superalloys, contributing to their strength and durability, especially in electron-beam melting. Industries like metallurgy, machinery processing, glass, and ceramics benefit from its corrosion-resistant properties. Tantalum serves as an additive in nickel-based superalloys, enhancing their performance in challenging conditions. Additionally, it plays a key role in the production of sputtering targets, vital for semiconductor manufacturing. Beyond this, tantalum is utilized in crafting artificial ears and for creating effective glass or metal seals.
Tantalum Physical Properties:
Density: 16.69 g/cm³
Melting Point:3290 K 3017°C 5463°F
Boiling Point: 5731 K 5458°C 9856°F
Tantalum Sputtering Target Applications:
1. Electronics: Tantalum Sputtering Targets are widely used in the electronics industry for the deposition of tantalum films in integrated circuits, capacitors, and other microelectronic components. The high purity and corrosion resistance of tantalum makes it an ideal material for these applications.2. Optics: Tantalum Sputtering Targets are also used in the optical industry for the deposition of tantalum films on optical components, such as lenses and mirrors. The high transparency and hardness of tantalum make it suitable for this application.
3. Thin-film solar energy: Tantalum Sputtering Targets are employed in the production of thin-film solar cells. The deposition of tantalum films on solar cells enhances their efficiency and reliability.
4. Magnetic storage: In the magnetic storage industry, Tantalum Sputtering Targets are used to deposit tantalum films on magnetic disks and tapes, improving their durability and performance.
5. Decorative coatings: Due to the attractive appearance of tantalum, Tantalum Sputtering Targets are also used in the production of decorative coatings for various consumer products, such as jewelry and watches.
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