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High Purity Titanium Sputtering Target
- Description
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Material Grade: Grade 1, ASTM Grade 2, Grade 5: Ti6Al4V
Standard: ASTM B 337/B338, ASTM B385-91,ASTM381, ISO 5832/2,JIS H4650,Din 17851
Purity: High purity (99.5%, 99.995%)
Shape: Discs (Diameter <350mm), Thickness>1mm Rectangle (Length 1800mm, Width 400mm Thickness>1mm
Tube ( Rotory target, OD: 20mm~160mm, Thickness: 2-20mm, Length: custom-made OD>160, Thickness >8mm, length <200)
Titanium Sputtering Target Description:
Titanium is a material that is widely used in watches, biomedical implants, drill bits, laptops, etc. In its pure metal form, Titanium is lustrous and silvery-white in appearance. It is a sturdy material and can be easily fabricated when heated. Its strong, lightweight characteristics and excellent corrosion resistance make it ideal for ocean liner hulls, aircraft engines, and designer jewelry. Titanium is a biocompatible material and therefore it has been used in surgical tools and medical implants. Titanium is generally evaporated in vacuum and deposited as coatings for the purposes of wear and decorative, semiconductor, and optical applications.
Titanium Sputtering Target Application:Deposited film nitride as Decorate thin film, Deposited film oxidized to TiO2 as beam splitter or insulator.
Titanium Physical Properties:
Density: 4.51g/cm³ Melting Point: 1660°C; Boiling Point:3287℃
Thermal conductivity: At 25°C, the thermal conductivity of titanium is 14.99 W/(m·K)
Coefficient of expansion: The coefficient of expansion of titanium is 8.36×10^-6/°C
Modulus of elasticity: The linear modulus of elasticity of titanium is 115 GPa and the shear modulus of elasticity is 44 GPa.
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